- 专利标题: Silicon nitride metal layer covers
-
申请号: US17246561申请日: 2021-04-30
-
公开(公告)号: US11876056B2公开(公告)日: 2024-01-16
- 发明人: Jonathan Andrew Montoya , Salvatore Franks Pavone
- 申请人: TEXAS INSTRUMENTS INCORPORATED
- 申请人地址: US TX Dallas
- 专利权人: TEXAS INSTRUMENTS INCORPORATED
- 当前专利权人: TEXAS INSTRUMENTS INCORPORATED
- 当前专利权人地址: US TX Dallas
- 代理商 Dawn Jos; Frank D. Cimino
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
In some examples, a semiconductor package includes a semiconductor die; a passivation layer abutting a device side of the semiconductor die; a first conductive layer abutting the device side of the semiconductor die; a second conductive layer abutting the first conductive layer and the passivation layer; a silicon nitride layer abutting the second conductive layer, the silicon nitride layer having a thickness ranging from 300 Angstroms to 3000 Angstroms; and a third conductive layer coupled to the second conductive layer at a gap in the silicon nitride layer, the third conductive layer configured to receive a solder ball.
公开/授权文献
- US20220352098A1 SILICON NITRIDE METAL LAYER COVERS 公开/授权日:2022-11-03
信息查询
IPC分类: