- 专利标题： System and method for measuring a sample by x-ray reflectance scatterometry
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申请号： US17114842申请日： 2020-12-08
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公开(公告)号： US11874237B2公开(公告)日： 2024-01-16
- 发明人: Heath Pois , David Reed , Bruno Shueler , Rodney Smedt , Jeffrey Fanton
- 申请人： NOVA MEASURING INSTRUMENTS INC.
- 申请人地址： US CA Freemont
- 专利权人： NOVA MEASURING INSTRUMENTS INC.
- 当前专利权人： NOVA MEASURING INSTRUMENTS INC.
- 当前专利权人地址： US CA Fremont
- 代理机构： Reches Patents
- 主分类号： G01N23/201
- IPC分类号： G01N23/201 ; G01N23/207 ; H01L21/66
摘要：
A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.
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