- 专利标题: Accuracy improvements in optical metrology
-
申请号: US17179379申请日: 2021-02-18
-
公开(公告)号: US11862522B2公开(公告)日: 2024-01-02
- 发明人: Barak Bringoltz , Evgeni Gurevich , Ido Adam , Yoel Feler , Dror Alumot , Yuval Lamhot , Noga Sella , Yaron De Leeuw , Tal Yaziv , Eltsafon Ashwal-Island , Lilach Saltoun , Tom Leviant
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Hodgson Russ LLP
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; G03F7/00 ; G03F9/00
摘要:
Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.
公开/授权文献
- US20210175132A1 ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY 公开/授权日:2021-06-10
信息查询
IPC分类: