Invention Grant
- Patent Title: Electrode configuration for extended plasma confinement
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Application No.: US17841593Application Date: 2022-06-15
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Publication No.: US11744001B2Publication Date: 2023-08-29
- Inventor: Eric T. Meier , Brian A. Nelson , Uri Shumlak
- Applicant: ZAP ENERGY, INC.
- Applicant Address: US WA Seattle
- Assignee: ZAP ENERGY, INC.
- Current Assignee: ZAP ENERGY, INC.
- Current Assignee Address: US WA Seattle
- Agency: Davis Wright Tremaine LLP
- Main IPC: H05H1/06
- IPC: H05H1/06 ; G21B1/05 ; G21B1/21 ; H05H1/54

Abstract:
Methods and systems are provided for plasma confinement utilizing various electrode and valve configurations. In one example, a device includes a first electrode positioned to define an outer boundary of an acceleration volume, a second electrode arranged coaxially with respect to the first electrode and positioned to define an inner boundary of the acceleration volume, at least one power supply to drive an electric current along a Z-pinch plasma column between the first second electrodes, and a set of valves to provide gas to the acceleration volume to fuel the Z-pinch plasma column, wherein an electron flow of the electric current is in a first direction from the second electrode to the first electrode. In additional or alternative examples, a shaping part is conductively connected to the second electrode to, in a presence of the gas, cause a gas breakdown of the gas to generate a sheared flow velocity profile.
Public/Granted literature
- US20220394840A1 ELECTRODE CONFIGURATION FOR EXTENDED PLASMA CONFINEMENT Public/Granted day:2022-12-08
Information query
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