发明授权
- 专利标题: Cleaning apparatus
-
申请号: US17578581申请日: 2022-01-19
-
公开(公告)号: US11696664B2公开(公告)日: 2023-07-11
- 发明人: Kazuhiro Io , Koji Sugita , Tomokazu Imae
- 申请人: OMRON Corporation
- 申请人地址: JP Kyoto
- 专利权人: OMRON Corporation
- 当前专利权人: OMRON Corporation
- 当前专利权人地址: JP Kyoto
- 代理机构: Metrolex IP Law Group, PLLC
- 优先权: JP 21036024 2021.03.08
- 主分类号: A47L5/34
- IPC分类号: A47L5/34 ; A47L9/00 ; A47L9/04 ; A47L9/06 ; A47L9/14
摘要:
A cleaning apparatus may include a cleaning unit that is kept from moving downwardly from a predetermined limit position. The apparatus body includes a positioning member that positions the cleaning unit at the limit position. The cleaning unit includes an intake nozzle that is arranged at a position separated from the surface to be cleaned by a predetermined gap, a cam member that holds the cleaning unit at the limit position, and an operation input unit that changes the limit position to a higher position by moving the cleaning unit upward by operating the cam member.
公开/授权文献
- US20220279996A1 CLEANING APPARATUS 公开/授权日:2022-09-08
信息查询