- 专利标题: Quasicrystalline material and semiconductor device applying the same
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申请号: US16776729申请日: 2020-01-30
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公开(公告)号: US11634793B2公开(公告)日: 2023-04-25
- 发明人: Eunsung Lee , Duseop Yoon , Joungeun Yoo , Dohyang Kim
- 申请人: Samsung Electronics Co., Ltd. , INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
- 申请人地址: KR Suwon-si; KR Seoul
- 专利权人: Samsung Electronics Co., Ltd.,INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
- 当前专利权人: Samsung Electronics Co., Ltd.,INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
- 当前专利权人地址: KR Suwon-si; KR Seoul
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2019-0050723 20190430
- 主分类号: C22C21/02
- IPC分类号: C22C21/02 ; H01L45/00
摘要:
A quasicrystalline material and a semiconductor device to which the quasicrystalline material is applied are disclosed. A quasicrystalline material is based on a quasicrystalline element having one or more axis of symmetry (e.g., a 2-fold axis, a 3-fold axis, a 5-fold axis, or a higher fold axes of symmetry). The quasicrystalline material is capable of phase changes between a quasicrystalline phase and an approximant crystalline phase having a further regular atom arrangement than the quasicrystalline phase. The quasicrystalline material that may be used as a phase change material and may be applied to a phase change layer of a semiconductor device.
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