发明授权
- 专利标题: Systems and methods for controlling substrate approach toward a target horizontal plane
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申请号: US16819004申请日: 2020-03-13
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公开(公告)号: US11621187B2公开(公告)日: 2023-04-04
- 发明人: Douglas Hill , Cian Sweeney , Manish Ranjan
- 申请人: Lam Research Corporation
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: Penilla IP, APC
- 主分类号: H01L21/687
- IPC分类号: H01L21/687 ; C25D17/00 ; C25D21/12 ; H01L21/67 ; C25D17/06
摘要:
A determination is made of a real-time azimuthal position of a notch alignment feature located on a support surface of a substrate holder relative to a fixed reference ray extending perpendicularly away from a rotational axis of the substrate holder as the substrate holder rotates about the rotational axis. A determination is made of an approach initiation azimuthal position of the notch alignment feature relative to the fixed reference ray at which vertical movement of the substrate holder should initiate in order to have the notch alignment feature located at a prescribed azimuthal position relative to the fixed reference ray when the substrate holder reaches a prescribed vertical position. A determination is made of a time delay required to have the notch alignment feature located at the approach initiation azimuthal position. Vertical movement of the substrate holder is initiated in accordance with the determined time delay.
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