Invention Grant
- Patent Title: Mask and method of manufacturing the same
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Application No.: US17231652Application Date: 2021-04-15
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Publication No.: US11616198B2Publication Date: 2023-03-28
- Inventor: Seil Kim , Euigyu Kim , Kwanhee Lee , Sang Min Yi , Junhyeuk Ko , Seungju Hong
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2020-0089131 20200717
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/56 ; C23C14/04 ; B05C21/00

Abstract:
A mask includes a first mask that includes a first long side that extends in a first direction and a first short side that extends in a second direction that crosses the first direction and that includes a first edge portion, a first center portion, and a first welded portion, that are sequentially arranged in the first direction. The mask further includes a second mask that includes a second long side that extends in the first direction and a second short side that extends in the second direction and that includes a second welded portion, a second center portion, and a second edge portion, that are sequentially arranged in the first direction. The first welded portion is in contact with the second welded portion.
Public/Granted literature
- US20220020926A1 MASK AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-01-20
Information query
IPC分类: