- 专利标题: Pressure calibration method and touch sensitive process apparatus and touch system implementing the method
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申请号: US17530875申请日: 2021-11-19
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公开(公告)号: US11614831B2公开(公告)日: 2023-03-28
- 发明人: Chin-Fu Chang , Shang-Tai Yeh
- 申请人: EGALAX_EMPIA TECHNOLOGY INC.
- 申请人地址: TW Taipei
- 专利权人: EGALAX_EMPIA TECHNOLOGY INC.
- 当前专利权人: EGALAX_EMPIA TECHNOLOGY INC.
- 当前专利权人地址: TW Taipei
- 代理机构: WPAT, PC
- 优先权: TW109146432 20201225
- 主分类号: G06F3/041
- IPC分类号: G06F3/041 ; G06F3/044
摘要:
A pressure calibration method, applicable to a touch panel which sequentially comprises a first electrode layer, an elastic dielectric layer and a second electrode layer, the first electrode layer includes multiple first electrodes in parallel to a first axis, the second electrode layer includes multiple second electrodes in parallel to a second axis, the pressure calibration method comprising: retrieving a depression event according to mutual capacitance sensing between the first electrodes and the second electrodes; finding a corresponding calibration area according to coordinate of the depression event; and calculating a calibrated pressure value according to a pressure sensing value of the depression event and a pressure calibration function of the corresponding calibration area.
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