- 专利标题: Charged particle beam system
-
申请号: US17512825申请日: 2021-10-28
-
公开(公告)号: US11562881B2公开(公告)日: 2023-01-24
- 发明人: Dirk Zeidler , Stefan Schubert , Ingo Mueller , Joerg Jacobi , Mario Muetzel , Antonio Casares , Christof Riedesel
- 申请人: Carl Zeiss MultiSEM GmbH
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss MultiSEM GmbH
- 当前专利权人: Carl Zeiss MultiSEM GmbH
- 当前专利权人地址: DE Oberkochen
- 代理机构: Fish & Richardson P.C.
- 主分类号: H01J37/14
- IPC分类号: H01J37/14 ; H01J37/05 ; H01J37/147 ; H01J37/21 ; H01J37/244 ; H01J37/28 ; H01J37/06
摘要:
A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.
公开/授权文献
- US20220108864A1 Charged Particle Beam System 公开/授权日:2022-04-07
信息查询