Invention Grant
- Patent Title: Charged particle beam system
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Application No.: US17512825Application Date: 2021-10-28
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Publication No.: US11562881B2Publication Date: 2023-01-24
- Inventor: Dirk Zeidler , Stefan Schubert , Ingo Mueller , Joerg Jacobi , Mario Muetzel , Antonio Casares , Christof Riedesel
- Applicant: Carl Zeiss MultiSEM GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss MultiSEM GmbH
- Current Assignee: Carl Zeiss MultiSEM GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: H01J37/14
- IPC: H01J37/14 ; H01J37/05 ; H01J37/147 ; H01J37/21 ; H01J37/244 ; H01J37/28 ; H01J37/06

Abstract:
A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.
Public/Granted literature
- US20220108864A1 Charged Particle Beam System Public/Granted day:2022-04-07
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