- 专利标题: Large-scale crossbar arrays with reduced series resistance
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申请号: US16193398申请日: 2018-11-16
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公开(公告)号: US11532786B2公开(公告)日: 2022-12-20
- 发明人: Ning Ge
- 申请人: TETRAMEM INC.
- 申请人地址: US CA Newark
- 专利权人: TETRAMEM INC.
- 当前专利权人: TETRAMEM INC.
- 当前专利权人地址: US CA Newark
- 代理机构: Jaffery Watson Mendonsa & Hamilton LLP
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L27/24 ; H01L43/02
摘要:
Technologies for reducing series resistance are disclosed. An example method may comprise: forming a first layer on a temporary substrate; forming a second layer on the first layer; etching the first layer and the second layer to form a trench; electroplating a top electrode via the trench, wherein the top electrode partially formed on a top surface of the second layer; removing the first layer and the second layer; forming a curable layer on the temporary substrate and the top electrode; removing the temporary substrate from the curable layer and the top electrode; forming a cross-point device on the curable layer and the top electrode; forming a bottom electrode on the cross-point device; and forming a flexible substrate on the bottom electrode.
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