- 专利标题： Self-assembled nanostructures including metal oxides and semiconductor structures comprised thereof
-
申请号： US16049329申请日： 2018-07-30
-
公开(公告)号： US11532477B2公开(公告)日： 2022-12-20
- 发明人: Nicholas Hendricks , Adam L. Olson , William R. Brown , Ho Seop Eom , Xue Chen , Kaveri Jain , Scott Schuldenfrei
- 申请人： Micron Technology, Inc.
- 申请人地址： US ID Boise
- 专利权人： Micron Technology, Inc.
- 当前专利权人： Micron Technology, Inc.
- 当前专利权人地址： US ID Boise
- 代理机构： TraskBritt
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; C08G81/00 ; H01L21/033 ; H01L21/3105 ; B81C1/00 ; C08L53/00 ; H01L21/02
摘要：
A self-assembled nanostructure comprises first domains and second domains. The first domains comprise a first block of a block copolymer material and an activatable catalyst. The second domains comprise a second block and substantially without the activatable catalyst. The activatable catalyst is capable of generating catalyst upon application of activation energy, and the generated catalyst is capable of reacting with a metal oxide precursor to provide a metal oxide. A semiconductor structure comprises such self-assembled nanostructure on a substrate.
公开/授权文献
信息查询
IPC分类:
