- 专利标题: Low-pressure plasma chamber, low-pressure plasma installation and method for producing a low-pressure plasma chamber
-
申请号: US16280028申请日: 2019-02-19
-
公开(公告)号: US11532465B2公开(公告)日: 2022-12-20
- 发明人: Christof-Herbert Diener
- 申请人: Christof-Herbert Diener
- 申请人地址: DE Nagold
- 专利权人: Christof-Herbert Diener
- 当前专利权人: Christof-Herbert Diener
- 当前专利权人地址: DE Nagold
- 代理机构: Hackler Daghighian Martino & Novak
- 优先权: DE102018103949.2 20180221
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; B28B11/00 ; C03B9/30 ; C03B11/12 ; H05H1/24 ; H05H1/46
摘要:
A parallelepipedal low-pressure plasma chamber body of glass is disclosed. The low-pressure plasma chamber may have electrodes at opposing sides of the low-pressure plasma chamber body. Furthermore, the low-pressure plasma chamber may have at opposing sides a door and a rear wall closure. The door and rear wall closure may in each case have at least one media connection in order to achieve a uniform gas flow in the low-pressure plasma chamber. The door may be assembled on the collar of the low-pressure plasma chamber body which extends radially away from the longitudinal axis of the low-pressure plasma chamber body. The low-pressure plasma chamber body is preferably produced using the pressing method or blow-and-blow method, in an analogous manner to industrial glass bottle production.
公开/授权文献
信息查询