Invention Grant
- Patent Title: Logic-embedded diode/tunnel diode coupled to floating gate with I-V characteristics suitable for logic state retention
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Application No.: US16147512Application Date: 2018-09-28
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Publication No.: US11495596B2Publication Date: 2022-11-08
- Inventor: Uygar E. Avci , Daniel H. Morris , Ian A. Young
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe Williamson & Wyatt PC
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L27/07 ; H01L25/18 ; H01L29/51 ; H01L27/02 ; H01L29/88 ; H01L27/11519

Abstract:
An integrated circuit structure comprises a substrate having a memory region of and an adjacent logic region. A first N type well (Nwell) is formed in the substrate for the memory region and a second Nwell formed in the substrate for the logic region. A plurality of memory transistors in the memory region and a plurality of logic transistors are in the logic region, wherein ones the memory transistors include a floating gate over a channel, and a source and a drain on opposite sides of the channel. A diode portion is formed over one of the source and the drain of at least one of the memory transistors to conduct charge to the floating-gate of the at least one of the memory transistors for state retention during power gating.
Information query
IPC分类: