- 专利标题: Single crystal horizontal access device for vertical three-dimensional (3D) memory and method of forming 3D memory
-
申请号: US17035856申请日: 2020-09-29
-
公开(公告)号: US11450693B2公开(公告)日: 2022-09-20
- 发明人: Haitao Liu , Si-Woo Lee
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Brooks, Cameron & Huebsch, PLLC
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; H01L21/223 ; H01L21/02
摘要:
Systems, methods and apparatus are provided for an array of vertically stacked memory cells having horizontally oriented access devices having a first source/drain region and a second source drain region separated by a channel region, and gates opposing the channel region, vertically oriented access lines coupled to the gates and separated from a channel region by a gate dielectric. The memory cells have epitaxially grow single crystal silicon to fill the first horizontal opening and house a first source/drain in electrical contact with a conductive material and to form part of an integral, horizontally oriented, conductive digit line. The memory cells also have horizontally oriented storage nodes coupled to the second source/drain region and horizontally oriented digit lines coupled to the first source/drain region. A vertical body contact is formed in direct electrical contact with a body region of one or more of the horizontally oriented access devices and separate from the first source/drain region and the horizontally oriented digit lines by a dielectric.
公开/授权文献
信息查询
IPC分类: