- 专利标题: Method of forming an aluminum oxide layer, metal surface with aluminum oxide layer, and electronic device
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申请号: US16012341申请日: 2018-06-19
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公开(公告)号: US11424201B2公开(公告)日: 2022-08-23
- 发明人: Michael Rogalli , Johann Gatterbauer , Wolfgang Lehnert , Kurt Matoy , Evelyn Napetschnig , Manfred Schneegans , Bernhard Weidgans
- 申请人: Infineon Technologies AG
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Murphy, Bilak & Homiller, PLLC
- 优先权: DE102017113515.4 20170620
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
A method of forming an aluminum oxide layer is provided. The method includes providing a metal surface including at least one metal of a group of metals, the group of metals consisting of copper, aluminum, palladium, nickel, silver, and alloys thereof. The method further includes depositing an aluminum oxide layer on the metal surface by atomic layer deposition, wherein a maximum processing temperature during the depositing is 280° C., such that the aluminum oxide layer is formed with a surface having a liquid solder contact angle of less than 40°.
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