- 专利标题: Vacuum robot apparatus for variable pitch access
-
申请号: US17188374申请日: 2021-03-01
-
公开(公告)号: US11358809B1公开(公告)日: 2022-06-14
- 发明人: Rajkumar Thanu , Jeffrey C. Hudgens , Karuppasamy Muthukamatchi
- 申请人: APPLIED MATERIALS, INC.
- 申请人地址: US CA Santa Clara
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Lowenstein Sandler LLP
- 主分类号: H01L21/677
- IPC分类号: H01L21/677 ; B65G47/91 ; H01L21/687
摘要:
Methods, systems, and devices including a robot apparatus with at least one lower arm configured to rotate about a first rotational axis and at least one upper arm rotatably coupled to the at least one lower arm at a second rotational axis that is spaced away from the first rotational axis. The robot apparatus further include a first end effector coupled to the upper arm. The robot apparatus further includes a second end effector coupled to the at least one upper arm. The robot apparatus is suitable for accommodating varying pitches between two adjacent processing chambers or between two adjacent load lock chambers. The robot apparatus may operate in dual substrate handling mode, single substrate handling mode, or a combination thereof. The robot apparatus may also be an off-axis robot.
信息查询
IPC分类: