- 专利标题: Resin, resist composition and method for producing resist pattern
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申请号: US16741815申请日: 2020-01-14
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公开(公告)号: US11353790B2公开(公告)日: 2022-06-07
- 发明人: Mutsuko Higo , Shingo Fujita , Koji Ichikawa
- 申请人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址: JP Tokyo
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Buchanan Ingersoll & Rooney PC
- 优先权: JPJP2019-007244 20190118
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/039 ; C08F220/18 ; C08F212/14 ; C08F220/38 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38
摘要:
Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)h3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1′ represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni≤5.
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