Invention Grant
- Patent Title: Cutting method for forming chamfered corners
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Application No.: US16279186Application Date: 2019-02-19
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Publication No.: US11338392B2Publication Date: 2022-05-24
- Inventor: Hsin-Yu Chang , Fu-Lung Chou , Chien-Jung Huang , Yu-Chung Lin , Min-Kai Lee
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsin-Chu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsin-Chu
- Agency: WPAT, PC
- Priority: TW107139884 20181109
- Main IPC: B23K26/36
- IPC: B23K26/36 ; B23K26/38 ; B23K26/40 ; B23K26/362 ; B23K103/00 ; B23K101/36 ; B23K101/18

Abstract:
A cutting method for forming a chamfered corner includes a step of selecting a light pattern-adjusting module according to a pre-cut chamfer angle, a step of the light pattern-adjusting module emitting a laser beam to a substrate and thus forming a modified region extending in a thickness direction at the substrate, a step of the light pattern-adjusting module adjusting an axial energy distribution of a light pattern of the laser beam to vary an appearance of the modified region so as to form the modified region fulfilling the pre-cut chamfer angle, and a step of etching the substrate having the modified region to form a chamfered surface on the substrate by cutting the modified region from the substrate.
Public/Granted literature
- US20200147729A1 CUTTING METHOD FOR FORMING CHAMFERED CORNERS Public/Granted day:2020-05-14
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