- 专利标题: Projection system and projector
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申请号: US17155171申请日: 2021-01-22
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公开(公告)号: US11333957B2公开(公告)日: 2022-05-17
- 发明人: Hirotaka Yanagisawa
- 申请人: SEIKO EPSON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: SEIKO EPSON CORPORATION
- 当前专利权人: SEIKO EPSON CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JPJP2020-009802 20200124
- 主分类号: G03B21/14
- IPC分类号: G03B21/14 ; G02B13/16 ; G03B21/28 ; G02B17/08
摘要:
A projection system includes a first optical system, a second optical system including a first optical element and a second optical element and disposed on the enlargement side of the first optical system, and a placement mechanism configured to selectively place one of the first and second optical elements on a first optical axis of the first optical system. The first optical element has a first light incident surface, a first reflection surface disposed on the enlargement side of the first light incident surface, and a first light exiting surface disposed on the enlargement side of the first reflection surface. The second optical element has a second light incident surface, a second reflection surface disposed on the enlargement side of the second light incident surface, and a second light exiting surface disposed on the enlargement side of the second reflection surface.
公开/授权文献
- US20210232035A1 PROJECTION SYSTEM AND PROJECTOR 公开/授权日:2021-07-29
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