- 专利标题: Array substrate, method of manufacturing thereof, and display panel
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申请号: US16626600申请日: 2019-12-04
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公开(公告)号: US11289517B2公开(公告)日: 2022-03-29
- 发明人: Suping Xi
- 申请人: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- 申请人地址: CN Shenzhen
- 专利权人: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- 当前专利权人: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- 当前专利权人地址: CN Shenzhen
- 优先权: CN201911031657.3 20191028
- 国际申请: PCT/CN2019/122905 WO 20191204
- 国际公布: WO2021/082170 WO 20210506
- 主分类号: H01L27/00
- IPC分类号: H01L27/00 ; H01L29/00 ; H01L27/12 ; H01L29/786
摘要:
An array substrate, a method of manufacturing thereof, and a display panel are provided. In the array substrate, a lesser thickness of an active layer in a GOA area achieves improved response time of thin film transistor in the GOA area, and a greater thickness of the active layer in a display area reduces diffusion of photons in the active layer, so as to decrease an influence of negative bias of thin film transistor in the display area. Additionally, different demands for characteristics of the array substrate in the display area and in the GOA area may be met, such that quality of the display panel may be improved.
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