- 专利标题: Flow rate control unit
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申请号: US16645060申请日: 2017-09-07
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公开(公告)号: US11287837B2公开(公告)日: 2022-03-29
- 发明人: Kenichi Shimizu , Yuki Kamizuru , Takahiro Kawamoto , Kouichi Mikumo
- 申请人: TOFLO CORPORATION
- 申请人地址: JP Hino
- 专利权人: TOFLO CORPORATION
- 当前专利权人: TOFLO CORPORATION
- 当前专利权人地址: JP Hino
- 代理机构: Muncy, Geissler, Olds & Lowe, P.C.
- 国际申请: PCT/JP2017/032375 WO 20170907
- 国际公布: WO2019/049291 WO 20190314
- 主分类号: G05D7/06
- IPC分类号: G05D7/06 ; F15B13/08
摘要:
The flow rate control unit 1 is comprised with each of the flow rate control devices 11 connected to (juxtaposedly mounted on) the manifold 2 by the joint 91 interposed between each of the flow rate control devices 11 and the manifold 2. Each of the flow rate control devices 11 can be attached to or detached from the manifold 2 by manually operating (attaching/detaching) the clip 93 without using a tool. Because there is no need to secure space to insert a tool between the adjacent flow rate control devices 11, the mounting pitch between the adjacent flow rate control devices 11 (joints 91) can be reduced to the minimum, allowing miniaturization of the flow rate control unit 1.
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