- 专利标题: Phase-change memory and method of forming same
-
申请号: US16727363申请日: 2019-12-26
-
公开(公告)号: US11245072B2公开(公告)日: 2022-02-08
- 发明人: Jau-Yi Wu
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L27/24
摘要:
A device and a method of forming the same are provided. The device includes a substrate, a first dielectric layer over the substrate, a bottom electrode extending through the first dielectric layer, a first buffer layer over the bottom electrode, a phase-change layer over the first buffer layer, a top electrode over the phase-change layer, and a second dielectric layer over the first dielectric layer. The second dielectric layer surrounds the phase-change layer and the top electrode. A width of the top electrode is greater than a width of the bottom electrode.
公开/授权文献
- US20210202837A1 PHASE-CHANGE MEMORY AND METHOD OF FORMING SAME 公开/授权日:2021-07-01
信息查询
IPC分类: