发明授权
- 专利标题: Skin treatment apparatus using RF energy and method for skin treatment using same
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申请号: US16041375申请日: 2018-07-20
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公开(公告)号: US11241277B2公开(公告)日: 2022-02-08
- 发明人: Kwang Chon Ko , Richard Howard Cohen
- 申请人: LUTRONIC CORPORATION
- 申请人地址: KR Goyang
- 专利权人: LUTRONIC CORPORATION
- 当前专利权人: LUTRONIC CORPORATION
- 当前专利权人地址: KR Goyang
- 优先权: KR10-2017-0107942 20170825
- 主分类号: A61B18/14
- IPC分类号: A61B18/14 ; A61B18/12 ; A61B18/00
摘要:
Disclosed herein are a skin treatment apparatus using RF energy and a skin treatment method using the same. There are provided a skin treatment apparatus using RF energy, including a first handpiece configured to include a first electrode unit coming into contact with a skin surface and to form perforations through which an agent penetrates by transferring RF energy to the skin surface through the first electrode unit, a second handpiece configured to include a second electrode unit inserted into the inside of the skin and to insert the second electrode unit into the inside of the skin into which the agent has penetrated and transfer the RF energy, and a controller configured to control parameters of the RF energy transferred to the first electrode unit and the second electrode unit, and a treatment method using the same.
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