发明授权
- 专利标题: Semiconductor storage device and semiconductor storage device manufacturing method
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申请号: US16816374申请日: 2020-03-12
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公开(公告)号: US11127753B2公开(公告)日: 2021-09-21
- 发明人: Koichi Yamamoto
- 申请人: Kioxia Corporation
- 申请人地址: JP Minato-ku
- 专利权人: Kioxia Corporation
- 当前专利权人: Kioxia Corporation
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JPJP2019-151443 20190821
- 主分类号: H01L27/11573
- IPC分类号: H01L27/11573 ; H01L27/11582 ; H01L21/768 ; H01L27/11526
摘要:
A semiconductor storage device of the embodiment includes a stacked body in which a plurality of conductive layers and a plurality of insulating layers are alternately stacked, the stacked body including a stepped portion in which ends of the plurality of conductive layers are stepped, a pillar penetrating the stacked body, the pillar having a memory cell at a height position of each of the plurality of conductive layers, a contact disposed at the stepped portion, the contact being connected to an n-th conductive layer when counted from a lowermost conductive layer of the plurality of conductive layers, and a region in an (n−1)th conductive layer when counted from the lowermost conductive layer of the plurality of conductive layers, the region being disposed at a position below the contact, the region being insulated from the (n−1)th conductive layer surrounding a periphery.
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