Invention Grant
- Patent Title: Apparatus using multiple charged particle beams
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Application No.: US16474027Application Date: 2017-12-22
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Publication No.: US11062874B2Publication Date: 2021-07-13
- Inventor: Weiming Ren , Xuedong Liu , Xuerang Hu , Zhong-wei Chen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- International Application: PCT/EP2017/084429 WO 20171222
- International Announcement: WO2018/122176 WO 20180705
- Main IPC: H01J37/145
- IPC: H01J37/145

Abstract:
The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.
Public/Granted literature
- US20190333732A1 AN APPARATUS USING MULTIPLE CHARGED PARTICLE BEAMS Public/Granted day:2019-10-31
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