发明授权
- 专利标题： Method for preparing an organic semiconductor layer and an organic electronic device
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申请号： US16329018申请日： 2017-08-30
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公开(公告)号： US10937966B2公开(公告)日： 2021-03-02
- 发明人: Steffen Runge , Carsten Rothe , Julien Frey , Uwe Gölfert
- 申请人： Novaled GmbH
- 申请人地址： DE Dresden
- 专利权人： Novaled GmbH
- 当前专利权人： Novaled GmbH
- 当前专利权人地址： DE Dresden
- 代理机构： Eversheds Sutherland (US) LLP
- 优先权： EP16186262 20160830
- 国际申请： PCT/EP2017/071709 WO 20170830
- 国际公布： WO2018/041864 WO 20180308
- 主分类号： H01L51/00
- IPC分类号： H01L51/00 ; H01L51/50 ; H01L51/56 ; C23C14/12 ; C23C14/24 ; C23C14/00
摘要：
The present invention relates to a method for preparing an organic semiconductor layer in a vacuum chamber at a pressure of 10−5 to 10−9 mbar comprising a step of sublimating a composition from a single vacuum thermal evaporation source arranged in the vacuum chamber, wherein the composition comprises a physical mixture of (a) a first organic aromatic matrix compound having a molecular weight ≥400 and ≤1,000: and (b) a first alkali organic complex having a molecular weight of ≥100 and ≤400.
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