- 专利标题: Facility condition monitoring device and facility condition monitoring method
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申请号: US15935775申请日: 2018-03-26
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公开(公告)号: US10935458B2公开(公告)日: 2021-03-02
- 发明人: Kentaro Hayashi , Takahiro Nakano , Atsushi Yuge , Masaaki Shibata
- 申请人: MITSUBISHI HEAVY INDUSTRIES, LTD.
- 申请人地址: JP Tokyo
- 专利权人: MITSUBISHI HEAVY INDUSTRIES, LTD.
- 当前专利权人: MITSUBISHI HEAVY INDUSTRIES, LTD.
- 当前专利权人地址: JP Tokyo
- 代理商 Manabu Kanesaka; Kenneth Berner; Benjamin Hauptman
- 优先权: JPJP2018-008792 20180123
- 主分类号: G01M13/028
- IPC分类号: G01M13/028 ; G01M13/045 ; F03D17/00 ; G05B23/02
摘要:
A facility condition monitoring device includes an abnormality-degree-calculation-model construction part which constructs an abnormality-degree-calculation model for calculating an abnormality degree of a monitoring feature group of a monitoring target facility, based on a normal feature group extracted from a state-quantity fluctuation data of the monitoring target facility, an abnormality degree calculation part which calculates the abnormality degree of the monitoring feature group with the abnormality-degree-calculation model, an abnormality determination part which determines whether the monitoring target facility is abnormal, based on the abnormality degree, an abnormality-contribution-rate calculation part which obtains a contribution rate of each feature constituting the monitoring feature group used for calculating the abnormality degree determined as abnormal by the abnormality determination part, and an abnormality cause identification part which identifies an abnormality cause of the monitoring target facility, based on the contribution rate and a cause-and-effect matrix representing a relationship between the abnormality cause and the features.
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