发明授权
- 专利标题: System and method for treating water systems with high voltage discharge and ozone
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申请号: US15713199申请日: 2017-09-22
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公开(公告)号: US10934182B2公开(公告)日: 2021-03-02
- 发明人: Adrian J. Denvir , David F. Vela , Matt C. Holloway
- 申请人: NCH Corporation
- 申请人地址: US TX Irving
- 专利权人: NCH Corporation
- 当前专利权人: NCH Corporation
- 当前专利权人地址: US TX Irving
- 代理机构: Ross Barnes LLP
- 代理商 Robin L. Barnes
- 主分类号: C02F1/32
- IPC分类号: C02F1/32 ; C02F1/46 ; C02F1/34 ; C02F1/36 ; C02F1/48 ; C02F1/78 ; C02F103/02
摘要:
A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.
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