- 专利标题: Laser apparatus and EUV light generating system
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申请号: US16674793申请日: 2019-11-05
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公开(公告)号: US10925143B2公开(公告)日: 2021-02-16
- 发明人: Katsuhiko Wakana
- 申请人: Gigaphoton Inc.
- 申请人地址: JP Tochigi
- 专利权人: Gigaphoton Inc.
- 当前专利权人: Gigaphoton Inc.
- 当前专利权人地址: JP Tochigi
- 代理机构: Studebaker & Brackett PC
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G02B26/08
摘要:
A laser apparatus includes an optical element disposed on a laser beam axis, an actuator configured to displace the optical element to displace the laser beam axis, a driving amount monitor configured to monitor a driving amount of the actuator, an optical axis monitor disposed along the laser beam axis and configured to monitor the laser beam axis, and a control unit configured to control the actuator based on a monitoring result of the optical axis monitor and determine abnormality of the optical element based on a monitoring result of the driving amount monitor.
公开/授权文献
- US20200077500A1 LASER APPARATUS AND EUV LIGHT GENERATING SYSTEM 公开/授权日:2020-03-05
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