Invention Grant
- Patent Title: Semiconductor device having magnetic tunnel junction pattern
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Application No.: US16010447Application Date: 2018-06-16
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Publication No.: US10861902B2Publication Date: 2020-12-08
- Inventor: Kilho Lee , Gwanhyeob Koh , Ilmok Park , Junhee Lim
- Applicant: Samsung Electronics Co., Ltd.
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Agency: Renaissance IP Law Group LLP
- Priority: KR10-2017-0074370 20170613; KR10-2017-0103249 20170814
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L27/1157 ; G11C11/16 ; H01L27/11582 ; H01L27/11573 ; H01L27/22 ; H01L27/11575 ; G11C14/00 ; G11C5/02 ; G11C16/04

Abstract:
A semiconductor device includes first conductive lines, second conductive lines crossing the first conductive lines, and memory cells at intersections between the first conductive lines and the second conductive lines. Each of the memory cells includes a magnetic tunnel junction pattern, a bi-directional switching pattern connected in series to the magnetic tunnel junction pattern, and a conductive pattern between the magnetic tunnel junction pattern and the bi-directional switching pattern.
Public/Granted literature
- US20180358555A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-12-13
Information query
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