Invention Grant
- Patent Title: System and method for measurement of complex structures
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Application No.: US15885583Application Date: 2018-01-31
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Publication No.: US10861755B2Publication Date: 2020-12-08
- Inventor: Andrew Weeks Kueny
- Applicant: Verity Instruments, Inc.
- Applicant Address: US TX Carrollton
- Assignee: Verity Instruments, Inc.
- Current Assignee: Verity Instruments, Inc.
- Current Assignee Address: US TX Carrollton
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01B11/06 ; G01N21/84 ; G06K7/00
Abstract:
A system and method of use for simplifying the measurement of various properties of complex semiconductor structures is provided. The system and method supports reduction of structure complexity and modeling for optical monitoring and permits determination of film thicknesses and feature depths during semiconductor manufacturing processes.
Public/Granted literature
- US20180226305A1 SYSTEM AND METHOD FOR MEASUREMENT OF COMPLEX STRUCTURES Public/Granted day:2018-08-09
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