- 专利标题： Vapor deposition mask and method for manufacturing vapor deposition mask
-
申请号： US16472919申请日： 2017-09-28
-
公开(公告)号： US10808314B2公开(公告)日： 2020-10-20
- 发明人: Koji Yamabuchi , Shinsaku Nakajima
- 申请人： Sharp Kabushiki Kaisha
- 申请人地址： JP Sakai
- 专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人地址： JP Sakai
- 代理机构： Keating & Bennett, LLP
- 国际申请： PCT/JP2017/035194 WO 20170928
- 国际公布： WO2019/064419 WO 20190404
- 主分类号： C23C14/24
- IPC分类号： C23C14/24 ; C23C14/04 ; H01L21/033 ; H01L51/00
摘要：
A valid portion formed on a mask sheet is provided to extend across a plurality of active regions on a vapor target substrate. The valid portion includes a first region and a second region. The first region is provided in a shape corresponding to a shape of each of the active regions for each of the active regions. The second region is located outside the first region, and is provided with a covering portion configured to cover a plurality of vapor deposition holes.
公开/授权文献
信息查询
IPC分类:
