- 专利标题: Fabricating method of QLED device and QLED device
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申请号: US15745036申请日: 2017-11-27
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公开(公告)号: US10784457B2公开(公告)日: 2020-09-22
- 发明人: Yuanchun Wu , Wei Yuan , Shibo Jiao , Zheng Xu
- 申请人: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- 申请人地址: CN Shenzhen
- 专利权人: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- 当前专利权人: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Shenzhen
- 代理机构: Hemisphere Law, PLLC
- 代理商 Zhigang Ma
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3e5211e7
- 国际申请: PCT/CN2017/113075 WO 20171127
- 国际公布: WO2019/080246 WO 20190502
- 主分类号: H01L51/50
- IPC分类号: H01L51/50 ; H01L51/56
摘要:
The disclosure provides a fabricating method of a QLED device and a QLED device. In the fabricating method of a QLED device, a mixed light-emitting layer is formed by doping a quantum dot material with a second hole transporting material having a valence band energy level between the quantum dot material and the first hole transporting material; a stepped barrier between the first hole transporting material and the doped second hole transporting material is used to enhance the hole injection; simultaneously, the first hole transporting material with a higher valence band energy level can block the electrons on one side of the hole transport layer close to the cathode to weaken the injection of electrons into the mixed light-emitting layer, thereby promoting the balance of carriers in the mixed light-emitting layer, improving the carrier recombination efficiency, and then improving the luminous efficiency and brightness of the QLED device.
公开/授权文献
- US20190386233A1 FABRICATING METHOD OF QLED DEVICE AND QLED DEVICE 公开/授权日:2019-12-19
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