发明授权
- 专利标题: Device for controlling a gaseous flow and systems and methods employing the device
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申请号: US15322791申请日: 2015-07-02
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公开(公告)号: US10781939B2公开(公告)日: 2020-09-22
- 发明人: Gianpiero Mensa , Raffaele Correale
- 申请人: Nanotech Analysis S.R.L.
- 申请人地址: IT Turin
- 专利权人: Nanotech Analysis S.R.L.
- 当前专利权人: Nanotech Analysis S.R.L.
- 当前专利权人地址: IT Turin
- 代理机构: Arent Fox LLP
- 代理商 Michael Fainberg
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@495e7b6a
- 国际申请: PCT/IB2015/054991 WO 20150702
- 国际公布: WO2016/005863 WO 20160114
- 主分类号: F16K99/00
- IPC分类号: F16K99/00 ; G01N1/22
摘要:
Disclosed are devices, systems and methods for gas sampling, for controlling and measuring a gaseous flow, and for controlling a pressure gradient. An exemplary device 1 for controlling a gaseous flow comprises a gaseous flow adjusting interface 2, configured to inhibit or allow a flow of gas through the device 1 in a controlled manner, and control means 3, 4 of the adjusting interface. The adjusting interface 2 comprises a plurality of nano-holes 20. Each of the nano-holes has sub-micrometric dimensions and is suitable to be opened or closed in a controlled manner. The control means 3,4, in turn, comprise actuating means 3, suitable to open or close these nano-holes, and electronic processing means 4, configured to activate the actuation means to open or close individually or collectively the nano-holes 20 in a controlled manner.
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