Invention Grant
- Patent Title: Wiping mechanism and substrate cleaning apparatus
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Application No.: US15749423Application Date: 2018-01-10
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Publication No.: US10751760B2Publication Date: 2020-08-25
- Inventor: Jie Shi
- Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Wuhan
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Wuhan
- Agency: Hemisphere Law, PLLC
- Agent Zhigang Ma
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6468669f
- International Application: PCT/CN2018/072129 WO 20180110
- International Announcement: WO2019/114076 WO 20190620
- Main IPC: B08B1/00
- IPC: B08B1/00 ; B08B1/02 ; B08B13/00 ; B08B3/02

Abstract:
A wiping mechanism is provided for wiping a substrate during transmission. The wiping mechanism comprises an upper wiping unit and a lower wiping unit moving back and forth for separately wiping an upper side and a lower side of the substrate. The moving directions of the upper wiping unit and the lower wiping unit are parallel to a loading plane for disposing the substrate and vertical to a transmission direction of the substrate, and the moving directions of the upper wiping unit and the lower wiping unit are opposite to each other, thereby to prevent the substrate being shifted due to wiping, to guarantee the effect of cleaning foreign particles from the surface of the substrate and to avoid scratching the surface of the substrate, to prevent the cleaning apparatus from being damaged, and to avoid affecting the substrate transmission. A substrate cleaning apparatus is also provided.
Public/Granted literature
- US20200086356A1 WIPING MECHANISM AND SUBSTRATE CLEANING APPARATUS Public/Granted day:2020-03-19
Information query
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