- Patent Title: Apparatus and method for developing a photoresist coated substrate
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Application No.: US16179724Application Date: 2018-11-02
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Publication No.: US10698313B2Publication Date: 2020-06-30
- Inventor: Tzung-Shiun Liu , Chun-Lang Chen , Ching-Yueh Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: G03D5/00
- IPC: G03D5/00 ; G03F7/00 ; G03F7/09 ; G03F7/32 ; G03F1/50 ; G03F7/30

Abstract:
An apparatus includes a developing tank and a fluid manifold in the bottom of the developing tank. The fluid manifold includes a plurality of holes through which developer flows and a plurality of valves corresponding to the plurality of holes. The valves allow developer to flow through the holes when open and prevent developer from flowing through the holes when closed. A trench surrounds the fluid manifold through which developer is drained from the developing tank. A controller is configured to control opening and closing of the valves. In an embodiment, the apparatus includes a clamping mechanism configured to insert the substrate into and remove the substrate from the developing tank.
Public/Granted literature
- US20190155151A1 APPARATUS AND METHOD FOR DEVELOPING A PHOTORESIST COATED SUBSTRATE Public/Granted day:2019-05-23
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