- 专利标题: Fabrication method for fused multi-layer amorphous selenium sensor
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申请号: US15761187申请日: 2017-11-30
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公开(公告)号: US10547015B2公开(公告)日: 2020-01-28
- 发明人: James Scheuermann , Wei Zhao
- 申请人: THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK
- 申请人地址: US NY Albany
- 专利权人: The Research Foundation for The State University of New York
- 当前专利权人: The Research Foundation for The State University of New York
- 当前专利权人地址: US NY Albany
- 代理机构: Scully, Scott, Murphy & Presser, P.C.
- 国际申请: PCT/US2017/063857 WO 20171130
- 国际公布: WO2018/102500 WO 20180607
- 主分类号: H01L51/40
- IPC分类号: H01L51/40 ; H01L27/30 ; H01L51/42 ; G01T1/24 ; G01T1/20 ; H01L31/0256
摘要:
A sensor including a layer of amorphous selenium (a-Se) and at least one charge blocking layer is formed by depositing the charge blocking layer over a substrate prior to depositing the amorphous selenium, enabling the charge blocking layer to be formed at elevated temperatures. Such a process is not limited by the crystallization temperature of a-Se, resulting in the formation of an efficient charge blocking layer, which enables improved signal amplification of the resulting device. The sensor can be fabricated by forming first and second amorphous selenium layers over separate substrates, and then fusing the a-Se layers at a relatively low temperature.
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