- 专利标题： Photocurable composition, method for forming a pattern, and method for producing a photocured product
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申请号： US15618868申请日： 2017-06-09
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公开(公告)号： US10535519B2公开(公告)日： 2020-01-14
- 发明人: Yohei Murayama , Toshiki Ito , Chieko Mihara , Motoki Okinaka
- 申请人： CANON KABUSHIKI KAISHA
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 代理机构： Venable LLP
- 优先权： JP2012-026144 20120209
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/004 ; G03F7/027 ; B82Y15/00 ; B82Y10/00 ; B82Y40/00 ; B29C33/62 ; B29C39/02 ; G03F7/00 ; G03F1/76 ; H01L21/308 ; B29C35/08
摘要：
It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C2H5O+ ion signal is higher than that of a C3H7O+ ion signal.
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