- 专利标题: Gas insensitive mass flow control systems and methods
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申请号: US16059906申请日: 2018-08-09
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公开(公告)号: US10534375B2公开(公告)日: 2020-01-14
- 发明人: Ryan Johnson , Alexei V. Smirnov , Patrick Albright , Cy Jordan , Arun Nagarajan
- 申请人: Hitachi Metals, Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Hitachi Metals, Ltd.
- 当前专利权人: Hitachi Metals, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Neugeboren O'Dowd PC
- 主分类号: G05D7/06
- IPC分类号: G05D7/06 ; G01F25/00
摘要:
Mass flow control systems and methods for controlling the mass flow rate of a gas through a primary conduit are disclosed. One mass flow control system includes a primary conduit for directing a flow of a gas and an adjustment system configured to divert a portion of the gas from the primary conduit to a secondary conduit and provide an adjustment signal that changes when a composition of the gas changes. A mass flow controller is operatively coupled to the primary conduit to control a primary flow rate of the gas. The mass flow controller includes a valve to control the primary flow rate of the gas and a control loop configured to receive the adjustment signal and control the valve to provide the primary flow rate of the gas at a set point.
公开/授权文献
- US20180348798A1 GAS INSENSITIVE MASS FLOW CONTROL SYSTEMS AND METHODS 公开/授权日:2018-12-06
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