发明授权
- 专利标题: Fine pitch BVA using reconstituted wafer with area array accessible for testing
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申请号: US15827550申请日: 2017-11-30
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公开(公告)号: US10529636B2公开(公告)日: 2020-01-07
- 发明人: Rajesh Katkar
- 申请人: Invensas Corporation
- 申请人地址: US CA San Jose
- 专利权人: Invensas Corporation
- 当前专利权人: Invensas Corporation
- 当前专利权人地址: US CA San Jose
- 代理机构: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- 主分类号: H01L23/31
- IPC分类号: H01L23/31 ; H01L23/498 ; H01L21/48 ; H01L21/56 ; H01L21/683 ; H01L23/00 ; H01L25/10 ; H01L21/78
摘要:
A method for simultaneously making a plurality of microelectronic packages by forming an electrically conductive redistribution structure along with a plurality of microelectronic element attachment regions on a carrier. The attachment regions being spaced apart from one another and overlying the carrier. The method also including the formation of conductive connector elements between adjacent attachment regions. Each connector element having the first or second end adjacent the carrier and the remaining end at a height of the microelectronic element. The method also includes forming an encapsulation over portions of the connector elements and subsequently singulating the assembly. into microelectronic units, each including a microelectronic element. The surface of the microelectronic unit, opposite the redistribution structure, having both the active face of the microelectronic element and the free ends of the connector elements so that both are available for connection with a component external to the microelectronic unit.
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