- 专利标题: Gas supply mechanism and semiconductor manufacturing apparatus
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申请号: US15508054申请日: 2015-09-24
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公开(公告)号: US10510514B2公开(公告)日: 2019-12-17
- 发明人: Yuki Hosaka , Yoshihiro Umezawa , Mayo Uda , Takashi Kubo
- 申请人: TOKYO ELECTRON LIMITED
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 代理机构: Studebaker & Brackett PC
- 优先权: JP2014-207207 20141008
- 国际申请: PCT/JP2015/076922 WO 20150924
- 国际公布: WO2016/056390 WO 20160414
- 主分类号: F16K3/08
- IPC分类号: F16K3/08 ; H01J37/32 ; H01L21/3065 ; C23C16/455 ; F16K31/04 ; H01L21/67
摘要:
According to an aspect, a gas supply mechanism for supplying a gas to a semiconductor manufacturing apparatus is provided. The gas supply mechanism includes a pipe connecting a gas source and the semiconductor manufacturing apparatus to each other, and a valve which is provided on the pipe. The valve includes a plate rotatable about an axis, the axis extending in a plate thickness direction, and a housing provided along the plate without contacting the plate to accommodate the plate, the housing providing a gas supply path along with the pipe. A through hole is formed in the plate, the through hole penetrating the plate at a position on a circle which extends around the axis and intersects the gas supply path.
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