Invention Grant
- Patent Title: Composition, laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor
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Application No.: US15599078Application Date: 2017-05-18
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Publication No.: US10510460B2Publication Date: 2019-12-17
- Inventor: Shohei Koizumi , Takashi Sugizaki , Kenji Miyamoto , Yusuke Kawakami
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2013-000631 20130107
- Main IPC: H01B3/46
- IPC: H01B3/46 ; H01L51/00 ; G03F7/004 ; G03F7/20 ; G03F7/038 ; G03F7/075 ; G03F7/40 ; C08L63/00 ; H01L51/05 ; H01L21/02 ; C08G59/32 ; C08G59/62 ; C08G59/68

Abstract:
A method of manufacturing a laminate, transistor, and method of manufacturing transistor using a composition that includes an organic compound having a hydroxy group; a first cross-linking agent that is at least one organic silicon compound selected from the group including an organic silicon compound including a siloxane bond in the molecule and having three or more cyclic ether groups in the molecule, a chain organic silicon compound including two or more siloxane bonds in the molecule and having two or more cyclic ether groups in the molecule, a cyclic organic silicon compound including D unit in the molecule and having four or more cyclic ether groups bonded to a silicon atom of the D unit in the molecule, and a cyclic organic silicon compound including a T unit in the molecule and having two or more cyclic ether groups in the molecule; and a photocationic polymerization initiator.
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