发明授权
- 专利标题: Apparatus for producing patterned illumination using arrays of light sources and lenses
-
申请号: US15546298申请日: 2016-01-26
-
公开(公告)号: US10509147B2公开(公告)日: 2019-12-17
- 发明人: Markus Rossi , Hans Peter Herzig , Philipp Mueller , Ali Naqavi , Daniel Infante Gomez , Moshe Doron , Matthias Gloor , Alireza Yasan , Hartmut Rudmann , Martin Lukas Balimann , Mai-Lan Elodie Boytard , Bassam Hallal , Daniel Pérez Calero , Julien Boucart , Hendrik Volkerink
- 申请人: AMS SENSORS SINGAPORE PTE. LTD.
- 申请人地址: SG Singapore
- 专利权人: AMS SENSORS SINGAPORE PTE. LTD
- 当前专利权人: AMS SENSORS SINGAPORE PTE. LTD
- 当前专利权人地址: SG Singapore
- 代理机构: Michael Best & Friedrich LLP
- 国际申请: PCT/SG2016/050033 WO 20160126
- 国际公布: WO2016/122404 WO 20160804
- 主分类号: G02B19/00
- IPC分类号: G02B19/00 ; G02B3/00 ; G02B3/04 ; G02B5/04 ; G02B27/09 ; G02B27/48 ; F21Y105/16 ; F21Y115/30
摘要:
An apparatus for producing structured light comprises a first optical arrangement which comprises a microlens array (L1) comprising a multitude of transmissive or reflective microlenses (2) which are regularly arranged at a lens pitch P and an illumination unit for illuminating the microlens array. The illumination unit comprises an array (S1) of light sources (1) for emitting light of a wavelength L each and having an aperture each, wherein the apertures are located in a common emission plane which is located at a distance D from the microlens array. For the lens pitch P, the distance D and the wavelength L, the following equation applies P2=2LD/N, wherein N is an integer with N≥1. High-contrast high-intensity light patterns can be produced. Devices comprising such apparatuses can be used for depth mapping.
公开/授权文献
- US20180267214A1 APPARATUS FOR PRODUCING PATTERNED ILLUMINATION 公开/授权日:2018-09-20
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B19/00 | 聚光镜(用于显微镜的入G02B21/08) |