- 专利标题: Method and apparatus for processing a substrate
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申请号: US15849371申请日: 2017-12-20
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公开(公告)号: US10508352B2公开(公告)日: 2019-12-17
- 发明人: Takahisa Okuzono , Jumpei Fujikata
- 申请人: Ebara Corporation
- 申请人地址: JP Tokyo
- 专利权人: EBARA Corporation
- 当前专利权人: EBARA Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Baker & Hostetler LLP
- 优先权: JP2016-255283 20161228
- 主分类号: C23C18/18
- IPC分类号: C23C18/18 ; C25D21/08 ; C25D21/12 ; C25D5/34 ; C23C18/16 ; C25D17/00 ; C25D17/06
摘要:
A method which can perform a soft pre-wetting treatment of a substrate, such as a wafer, with use of a pre-wetting liquid in a smaller amount. This method includes: holding a substrate between a first holding member and a second holding member, with the surface of the substrate being exposed through an opening of the second holding member, and pressing a sealing ridge of the substrate holder against a peripheral portion of the substrate; pressing a sealing block against the substrate holder; forming a vacuum in an external space; performing a seal inspection to check a sealed state provided by the sealing ridge based on a change in pressure in the external space; and performing a pre-wetting treatment by supplying a pre-wetting liquid to the external space while evacuating air from the external space to bring the pre-wetting liquid into contact with the exposed surface of the substrate.
公开/授权文献
- US20180179656A1 METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE 公开/授权日:2018-06-28
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