- 专利标题： Substrate processing apparatus, substrate processing method, and computer-readable recording medium having stored thereon substrate processing program
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申请号： US15307427申请日： 2015-05-01
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公开(公告)号： US10475638B2公开(公告)日： 2019-11-12
- 发明人: Kazuyoshi Shinohara , Yuki Yoshida
- 申请人： Tokyo Electron Limited
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 代理机构： Pearne & Gordon LLP
- 优先权： JP2014-094640 20140501
- 国际申请： PCT/JP2015/063091 WO 20150501
- 国际公布： WO2015/167012 WO 20151105
- 主分类号： B08B3/02
- IPC分类号： B08B3/02 ; H01L21/02 ; B08B3/08 ; H01L21/67 ; F26B21/00 ; F26B15/04
摘要：
A substrate processing apparatus includes a substrate rotating unit 11 configured to hold and rotate a substrate 3; a processing liquid supplying unit 13 configured to supply a processing liquid to the substrate; and a replacement liquid supplying unit 14 configured to supply, to the substrate, a replacement liquid with which the processing liquid supplied from the processing liquid supplying unit is replaced. While the replacement liquid supplying unit 14 supplies the replacement liquid to the substrate, the processing liquid supplying unit 13 supplies the processing liquid to a position on the substrate positioned at an outer peripheral side thereof than a supply position of the replacement liquid to form a liquid film of the processing liquid. It is possible to maintain a state in which the entire surface of the substrate is covered with the liquid film without increasing consumption amount of the replacement liquid.
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