- 专利标题: Radiation system and optical device
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申请号: US15766225申请日: 2016-10-25
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公开(公告)号: US10359710B2公开(公告)日: 2019-07-23
- 发明人: Hendrikus Gijsbertus Schimmel , Jeroen Marcel Huijbregtse , Maarten Van Kampen , Pieter-Jan Van Zwol
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权: EP15193999 20151111
- 国际申请: PCT/EP2016/075655 WO 20161025
- 国际公布: WO2017/080817 WO 20170518
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H05G2/00 ; G21K1/06
摘要:
A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.
公开/授权文献
- US20180307146A1 A Radiation System and Optical Device 公开/授权日:2018-10-25
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