- 专利标题： Resistance variable element methods and apparatuses
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申请号： US15837896申请日： 2017-12-11
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公开(公告)号： US10242738B2公开(公告)日： 2019-03-26
- 发明人: Seshadri K. Kolluri , Rajesh N. Gupta
- 申请人： Micron Technology, Inc.
- 申请人地址： US ID Boise
- 专利权人： Micron Technology, Inc.
- 当前专利权人： Micron Technology, Inc.
- 当前专利权人地址： US ID Boise
- 代理机构： Schwegman Lundberg & Woessner, P.A.
- 主分类号： G11C5/06
- IPC分类号： G11C5/06 ; G11C13/00 ; G11C11/56
摘要：
Apparatus and methods are disclosed, including a method that performs a first operation on a first resistance variable element using a common source voltage, a first data line voltage and a first control gate voltage, and then performs a second operation on a second resistance variable element using the common source voltage, a second data line voltage and a second control gate voltage. Additional apparatus and methods are described.
公开/授权文献
- US20180166138A1 RESISTANCE VARIABLE ELEMENT METHODS AND APPARATUSES 公开/授权日：2018-06-14
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