- 专利标题: Multi-directional self-aligned multiple patterning
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申请号: US15605327申请日: 2017-05-25
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公开(公告)号: US10199270B2公开(公告)日: 2019-02-05
- 发明人: Colin Bombardier , Ming He , Vikrant Chauhan , Anbu Selvam KM Mahalingam , Keith Donegan
- 申请人: GLOBALFOUNDRIES Inc.
- 申请人地址: KY Grand Cayman
- 专利权人: GLOBALFOUNDRIES Inc.
- 当前专利权人: GLOBALFOUNDRIES Inc.
- 当前专利权人地址: KY Grand Cayman
- 代理机构: Thompson Hine LLP
- 代理商 Anthony Canale
- 主分类号: H01L21/768
- IPC分类号: H01L21/768 ; H01L21/66 ; H01L23/522 ; H01L23/528
摘要:
Interconnect structures and methods of fabricating an interconnect structure. First and second non-mandrel interconnects are formed in an interlayer dielectric layer. The first non-mandrel interconnect and the second non-mandrel interconnect have respective side surfaces that extend in a first direction. The connector interconnect extends in a second direction transverse to the first direction from the side surface of the first non-mandrel interconnect to the side surface of the second non-mandrel interconnect.
公开/授权文献
- US20180342421A1 MULTI-DIRECTIONAL SELF-ALIGNED MULTIPLE PATTERNING 公开/授权日:2018-11-29
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