- 专利标题: Film formation device
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申请号: US13990641申请日: 2011-03-15
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公开(公告)号: US10121931B2公开(公告)日: 2018-11-06
- 发明人: Hiroyuki Orita , Takahiro Shirahata , Akio Yoshida
- 申请人: Hiroyuki Orita , Takahiro Shirahata , Akio Yoshida
- 申请人地址: JP Tokyo
- 专利权人: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- 当前专利权人: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 国际申请: PCT/JP2011/055986 WO 20110315
- 国际公布: WO2012/124047 WO 20120920
- 主分类号: B05B7/04
- IPC分类号: B05B7/04 ; C23C16/448 ; C23C16/455 ; H01L31/18 ; B05B1/04 ; B05B7/00
摘要:
The present invention includes a mist generator that generates a mist of a raw material of a film to be formed, and a mist jet nozzle that jets the mist generated by the mist generator to a substrate on which a film is to be formed. The mist jet nozzle includes: a main body having a hollow portion; a mist supply port that supplies the mist; a spout that jets the mist to the outside; a carrier gas supply port that supplies a carrier gas; and a shower plate having a plurality of holes formed therein. By the arrangement of the shower plate, the hollow portion is divided into a first space connected to the carrier gas supply port and a second space connected to the spout. The mist supply port is connected to the second space.
公开/授权文献
- US20130247820A1 FILM FORMATION DEVICE 公开/授权日:2013-09-26
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